Water-vapor-permeable Polyurethane Ionomer

第44卷第5期复旦学报(自然科学版)Vol.44 No.52005年10月Journal of Fudan University (Natural Science)Oct.2005Article ID: 0427-7104(2005)05-0659-01Water-vapor-permeable Polyurethane IonomerLIOU Y.J. ,Chao D. Y.(Institue of Applied Chemistry, Chinexe Culure Unitersiry, Hua Kang , Yang Ming Shan , Taipei , Taivan, China)Keywords: water vapor; polyurethane ionomer; siloxane compoundCLC number:O 626Document code:A1 IntroductionThe reaction of toluene disocyanate with 2,2,3,3-tetrafluoro 1-propanol ( fluoro compound) or 3-glyci-doxypropyl trimethoxysilane (siloxane compound) and other additives to form the structure of the fluoro-basedor siloxane based polyurethane (PU) ionomer has been proven by infrared spectra.2 Results and DiscussionExperimental results indicated that the amount of water vapor permeability of the film made by fluoro-based or siloxane- based PU ionomer appeared to gradually increase with increasing concentration of the silox-ane compounmd or fluoro compound, as a result of the formation of more porosities. Our experimental resultsalso showed that the water vapor absorption was seen to be larger for the film made by siloxane based PUionomer film than for the film made by fluoro-based PU ionomer film, as a result of increased hydrophilicgroups attached to the backbone of the PU ionomer molecule. For the film prepared by siloxane -based PUionomer, both tensile strenght and elongation appeared to increase with an increase in the concentration ofsiloxane compound. This may be the result of the intermolecular interaction between siloxane-based PUionomer molecules themselves , thus enhancing the crosslinking capability of the ionomer molecules. On the oth-er hand, both tensile strength and elongation for the film prepared by fluoro based PU ionomer decreased withincreasing concentration of the fluore compound, as a result of intramolecular interaction greatly reducing thecrosslinking capability of the ionomer molecules.中国煤化工MYHCNMHGReceived date: 2005-09-02Biography: LIOU Y.J. ,Correspondence author Chao D. Y.